High-Purity 1-(Chloromethyl)-2-Vinylbenzene for Photoresist Applications
url-slug: high-purity-1-chloromethyl-2-vinylbenzene-photoresist
Product Summary: This high-purity grade of 1-(chloromethyl)-2-vinylbenzene (CAS 22570-84-9) is specifically engineered for synthesizing high-performance negative photoresist resins, including E-beam photoresists, and advanced packaging dielectric materials. With ppb-level metal impurity control and production in GMP cleanrooms, it meets the stringent requirements of semiconductor and electronic material manufacturing.
Key Selling Points
- Photoresist-grade purity: Metal impurities <10 ppb, meeting SEMI Grade 4 standards, ensuring reliability in advanced lithography processes.
- Precision synthesis: Microchannel continuous flow technology enables high-purity production and batch-to-batch consistency.
- Cleanroom production: Manufactured in GMP cleanrooms with rigorous control of particles and metal ions, ideal for semiconductor applications.
- Proven performance: Helped clients pass verification by top-tier Korean wafer fabs and achieve mass production for 193nm immersion lithography.
- Rapid sampling: Process optimization and first validation sample delivery completed within 2 weeks.
Technical Specifications
| Product Name | 1-(chloromethyl)-2-vinylbenzene |
| CAS | 22570-84-9 |
| Molecular Formula | C9H9Cl |
| Molecular Weight | 152.62 |
| EINECS | 245-092-5 |
| Boiling Point | 223.4±9.0 °C (Predicted) |
| Density | 1.066±0.06 g/cm³ (Predicted) |
| Appearance | Light yellow to colorless liquid |
Models and Options
Available in standard electronic grade packaging. Custom isomer ratios and high-purity grades can be developed per client requirements.
Materials and Structure
The product is a chloromethylated styrene derivative with a vinyl group and chloromethyl group, enabling polymerization and further functionalization. It is moisture-sensitive and must be stored in a dry, sealed environment under inert gas.
Applications
Ideal for synthesizing negative photoresist resins (E-beam), advanced packaging dielectric materials, and homogeneous ion-exchange membranes. Also used in ultra-pure water resins and chelating resins.
Customization
Custom isomer ratio development, high-purity variants, and CDMO process development are available. From lab route optimization to industrial scale-up.
Case Study
Leading international semiconductor material company: Achieved mass production for 193nm immersion lithography photoresist with metal impurities <10 ppb, passing verification by a top-tier Korean wafer fab. Annual supply of 5 tons.
FAQ
- What is the minimum order quantity? MOQ is 1 kg.
- How is the product shipped? Sea freight, air freight, or international express (DHL/FedEx/UPS) depending on order size and urgency.
- What quality control measures are in place? Each batch undergoes full testing including GC/HPLC purity, moisture, and metal content. COA provided. Third-party inspection (SGS/BV) available.
- What is the typical lead time? Sample orders 3-5 days via express; bulk orders 15-35 days by sea.
- Can you provide custom isomer ratios? Yes, custom o/m/p isomer ratios can be developed per your formulation needs.
Inquiry Information
Contact our sales team for pricing, samples, and technical support:
- Email: sales@jumingchem.com
- Phone/WhatsApp: +86 159 6162 4309
- Website: https://en.jmchemchina.com/
Images
Main image: 1-(chloromethyl)-2-vinylbenzene product bottle (photobank-1)
Additional images: molecular structure and packaging (photobank-42, photobank-49)
