SiC Cantilever Paddle for Diffusion Furnaces with Up to 15kg Load Capacity

Name: "SiC Cantilever Paddle for Diffusion Furnaces with Up to 15kg Load Capacity"
Rating: 5 (751 reviews)

جرد:

SKU: 5959808307

الطراز: SiC-03

Semicera

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SiC Cantilever Paddle for Diffusion Furnaces

This SiC cantilever paddle (model SiC-03) is engineered for automated cantilever loader beams in diffusion furnaces. It features a sintered RSiC core matrix with a CVD SiC coating, providing high-temperature strength and minimal deflection. Suitable for oxidation and diffusion processes, it ensures reliable wafer transfer with low contamination.

Key Selling Points

High Load Capacity: Supports up to 15 kg at temperatures above 1100°C, enabling safe handling of heavy wafer batches.
Minimal Deflection: Deflection ≤ 2.0 mm at maximum reach (>2000 mm), ensuring positioning accuracy and process stability.
High-Temperature Durability: CVD SiC coating on sintered RSiC core provides thermal shock resistance and long service life in harsh environments.
Particle-Free Surface: Ground finish with particle-free quality minimizes contamination, critical for semiconductor processes.
Customizable Length: Length can be customized between 1500-3500 mm to fit various furnace configurations.

Technical Specifications

Model	SiC-03
Type	Automated Cantilever Loader Beam for Diffusion Furnaces
Material	CVD SiC coating + SiSiC
Core Matrix	Sintered RSiC
Deflection under Load	≤ 2.0 mm at maximum reach (>2000 mm)
Load Capacity	Up to 15 kg at high temperatures (>1100°C)
Surface Roughness	Ground finish, particle-free
Length Range	1500 – 3500 mm (customizable)

Models and Options

Standard model SiC-03 is available. Custom lengths and configurations can be engineered to meet specific furnace requirements. Please contact us for detailed options.

Materials and Structure

The paddle uses a sintered RSiC core matrix, coated with CVD SiC for enhanced purity and performance. The combination provides excellent thermal conductivity and mechanical strength at high temperatures.

Applications

Designed for oxidation and diffusion processes in semiconductor device manufacturing. Also used in wafer loading automation and cantilever beam systems.

Customization

Custom lengths (1500-3500 mm) and special configurations are available. Our engineering team can tailor the paddle to your specific furnace and process needs.

Case Study

North America Market: 900 units per month used for epitaxy process. Over 2 years under continuous high-temperature conditions, achieving stable mass production with consistent epitaxial uniformity and reduced equipment maintenance downtime by 15%.

FAQ

What is the maximum load capacity of this SiC paddle?

Up to 15 kg at high temperatures above 1100°C.

What is the deflection under maximum load?

≤ 2.0 mm at maximum reach (>2000 mm).

Can the length be customized?

Yes, length can be customized between 1500–3500 mm.

What materials are used?

CVD SiC coating on a sintered RSiC core (SiSiC).

Is this paddle suitable for oxidation processes?

Yes, it is specifically designed for oxidation and diffusion processes.

Do you provide pre-shipment testing?

Yes, pre-shipment tests are conducted as part of our acceptance process.

Inquiry Information

MOQ: 1 unit. Delivery terms: EXW/FCA/DAP/DDP. Payment: new customers 100% T/T in advance; long-term customers 70/30. For inquiries, contact sales05@semi-cera.com.

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SiC-03 cantilever paddle for diffusion furnace